Powall

powall.com

Powall offers research & development services and licensing of IP on scalable production of nanostructured materials based on Atomic Layer Deposition (ALD). ALD is a chemical deposition method to obtain conformal coatings of controllable thickness on many types of substrate. Together with the Powall intellectual property and know-how on scalable production of nanostructured materials, this allows for efficient precursor use for catalysts, encapsulation of battery particles for improved durability, controlled release of medication, and many more applications. Don't hesitate to contact us at info@powall.com for more information.

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