Delft IMP offers research & development services and licensing of IP on scalable production of nanostructured materials based on atomic layer deposition (ALD). ALD is a chemical deposition method to obtain conformal coatings of controllable thickness on many types of substrate. Together with the Delft IMP intellectual property and know-how on scalable production of nanostructured materials, this allows for efficient precursor use for catalysts, encapsulation of battery particles for improved durability, controlled release of medication, and many more applications.